tantalum oxide

[ˈtæntələm ˈɒksaɪd]
  • tantalum oxide
  • 释义

    氧化钽

纠错 数据更新时间:2026-04-19 14:56:32
1、

Production of Ultra-pure Tantalum Oxide/ Ultra-pure Niobium Oxide from CH_3 ( CH_2)_5CHOHCH_3-HF-H_2SO_4 System

仲辛醇-HF-H2SO4体系制取超高纯氧化钽和超高纯氧化铌

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2、

The microstructure of tantalum oxide film was analyzed by Atomic Force Microscope and Transmitting Electron Microscope. The I U characteristics of the MIM thin film diode were also measured.

用原子力显微镜和透射电子显微镜分析了Ta2O5膜的微结构,测试了MIM薄膜二极管的IU特性曲线。

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3、

An Angle-resolved TOF Study on the UV Laser Ablation of Tantalum Oxide

角分辨飞行时间法研究紫外激光烧蚀Ta2O5的反应

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4、

The technology and properties of Tantalum Oxide coating material have been introduced.

介绍了五氧化二钽镀膜材料的制作工艺及材料和膜层性能。

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5、

Conclusion No adverse effect of tantalum and its oxide on the exposed workers was found.

结论未发现钽对接触工人有不良影响。

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6、

Besides the influence of crystal structure, the better stability of zirconium oxide and tantalum oxide can improve the chemical and thermal stability of ITO films.

除了晶体结构的影响之外,稳定性较好的氧化锆和氧化钽也提高了薄膜的化学稳定性和热稳定性。

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7、

The Fabrication and Properties of Tantalum Oxide and Tantalum Nitride Films

Ta-O及Ta-N薄膜的制备及其性能研究

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8、

Tantalum oxide thin films were deposited by reactive DC magnetron Sputtering from a tantalum target in Ar-O2 mixture.

在Ar-O2混合气氛中采用直流磁控反应溅射沉积制得了氧化钽薄膜。

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9、

I-V characteristics of high dielectric constant tantalum oxide films

五氧化二钽薄膜的I&V特性

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10、

Iridium-Tantalum Oxide Anode Coatings

铱钽氧化物阳极涂层的研究

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11、

XRD results show that the anatase phase of titanium dioxide films can be fabricated at 400 ℃, and at this temperature, the deposited tantalum oxide and silicon dioxide were amorphous.

对制备的薄膜进行XRD测试表明,在基片温度为400℃时能制备出TiO2薄膜晶体,结构为锐钛矿型,而在此温度下,SiO2和Ta2O5却只能得到非晶态的结构。

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12、

Tantalum oxide and tantalum nitride films with different composition, microstructure, physical and mechanical properties fabricated by unbalanced magnetron sputtering were investigated in this paper.

本论文采用非平衡磁控溅射技术制备出不同成分、结构、物理性能和力学性能的Ta-O和Ta-N薄膜。

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13、

A Study of Tantalum Oxide Humidity Sensitive Thin Films

氧化钽感湿薄膜的研究

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14、

Tantalum oxide ( Ta_2O_5) thin film photocatalysts were prepared on single crystal Si ( 110) substrates via sol-gel and spin coating methods.

利用溶胶-凝胶法和旋转镀膜法在单晶Si(110)基底上制备了Ta2O5光催化剂薄膜。

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15、

The tantalum oxide coating material Chemical structure of HgCdTe-anodic oxide

五氧化二钽镀膜材料碲镉汞阳极氧化层的化学结构分析

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16、

Determination of impurity in high purity tantalum and its oxide by ICP-AES after trace-matrix separation

分离基体ICP-AES法测定高纯钽及其氧化物中杂质元素

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17、

Properties of Composite Electrode of Tantalum Oxide and Molybdenum Nitride

氮化钼与五氧化二钽复合电极性能的研究

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18、

Tantalum oxide has proven to be an effective photocatalyst owing to its broad band gap and good chemical resistance.

作为一种新型的光催化材料,五氧化二钽(Ta2O5)以其禁带宽度大、化学稳定性好等特点引起了人们广泛的关注。

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19、

Kinetics of reduction of niobium oxide and tantalum oxide in fluorine-containing slag in blast furnace smelting

含氟高炉渣中氧化钽和氧化铌的还原动力学研究

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20、

The effects of tantalum concentration, temperature and reaction time on the particle size and morphology, and the effects of temperature and calcined time on the crystalline of tantalum oxide have been investigated.

研究了水解过程中乙醇钽浓度、温度、加料时间对产品粒度的影响以及煅烧温度与时间对Ta2O5晶形的影响。

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21、

A mineral consisting of tantalum oxide of iron and manganese that occurs with niobite or in coarse granite; an ore of tantalum.

一种由铁和锰的钽氧化物组成的矿物,与铌铁矿共生,亦见于粗糙的花岗岩中,是一种钽矿石。

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22、

The Research Progress of High Dielectric Constant Tantalum Oxide Films as MOSFET-gate

五氧化二钽高K薄膜作为MOSFET绝缘栅研究

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23、

Optical Properties of Aluminium Lanthanum Strontium Tantalum Oxide Crystal

钽铝酸锶镧单晶的光学性能

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